ZEISS AIMS 1x-193i is used for defect review, printability analysis and repair verification and qualifies photomasks with high precision and accuracy for todays and future technology nodes. AIMS^® 1x-193i addresses the challenges of increased feature complexity, tighter mask specifications and more accurate and reliable defect disposition by offering an excellent CD repeatability and full illumination flexibility utilizing FlexIllu®, a computer controlled illumination and key enabler for SMO technology. The platform offers future performance upgrades to enhance the system capability with respect to CD repeatability and throughput to keep with ongoing technology demands. Furthermore, the AIMS^® 193nm high-end platform supports additional applications such as AIMS^® AutoAnalysis for fully automated and reliable analysis of aerial images and WLCD 2G for a printing aware CD metrology.